Semiconductor material

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Etching wafer
Brief introduction of Etching waferThe etching wafer has the characteristics of low roughness, good glossiness and relatively low cost, and directly substitutes the polished wafer or epitaxial wafer which has relatively high cost to produce the elect...
Polished wafer
FZ polished wafers SpecificationsCZ polished wafers Specifications
Float-zone mono-crystalline silicon wafer
FZ-SiliconThe mono-crystalline silicon with the characteristics of low foreign-material content, low defect density and perfect crystal structure is produced with the float-zone process; no foreign material is introduced during the crystal growth. Th...
Czochralski mono-crystalline silicon wafer
CZ-SiliconThe heavily/lightly-doped CZ mono-crystalline silicon is suitable for producing various integrated circuits (IC), diodes, triodes, green-energy solar panel. The special elements (such as Ga, Ge) can be added to produce the high-efficiency, ...